Sputtering targets are used in PVD coating (PVD = physical vapor deposition) as a source for the coating material, which through the bombardment with high energy particles transfers into the gas phase and is then deposited in extremely thin layers on different surfaces. By this method, coatings with special optical, electrical or other characteristics are being achieved for example on large plasma screens, displays of laptops, mobile phones or architectural glass.
With the Alpha 4200, having a maximum pressing force of 42 000 kN (= 4200 t), large sputtering targets with dimensions up to about 1600 mm in length and 500 mm width with a thickness of only 8-14 mm, can be pressed with uniform density.
The PH 6500 with a pressing force of 6 500 t can produce sputtering targets even larger, up to approx. 0.8 m².
The Alpha 800 (pressing force = 800 t) is used for the production of sputtering targets with smaller dimensions. Materials to be used are indium tin oxide (ITO), alumina doped zinc oxide (AZO) and others. AZO powder for this application as well as supports for the firing process can be produced by the Laeis subsidiary Alpha Ceramics in Aachen.
Having already sold several presses for this application to different customers in Korea over the recent years, now all the major manufacturers of sputtering targets in Korea trust in the Laeis shaping technology, and other producers in East Asia, Europe and USA have started to follow.